The difference between plasma cleaning and wet cleaning
Author： Shenzhen three and wave of Electrical and Mechanical Technology Co., LtdIssuing Time：2017-08-03 09:00:22Pageviews：4432【smallmediumbig】
Today, cleaning in the electronics industry can be roughly divided into two types: wet cleaning and dry cleaning. Wet cleaning has been widely used in the electronics industry, but the pollution caused by wet cleaning and toxic chemicals on the environmental hazards become troublesome problems. Relatively speaking, dry...
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Today, cleaning in the electronics industry can be roughly divided into two types: wet cleaning and dry cleaning. Wet
cleaning has been widely used in the electronics industry, but the
pollution caused by wet cleaning and toxic chemicals on the
environmental hazards become troublesome problems. Relatively
speaking, dry cleaning in this area has a great advantage, especially
in the plasma cleaning technology as an example has been gradually in
the semiconductor, electronic assembly, precision machinery, medical and
other industries widely used. Therefore, it is necessary to understand the difference between the next plasma cleaning technology and general wet cleaning.
Wet
cleaning is mainly dependent on the role of physical and chemical
solvents, such as chemical agents need to be adsorbed, soaked,
dissolved, scattered under the action supplemented by ultrasonic, spray,
rotation, boiling, steam shake and other physical effects of
decontamination. The
mechanism of cleaning with a plasma cleaning machine is to rely on the
"activation" of the substance in the "plasma state" to achieve the
purpose of removing the surface stains of the object. From the current variety of cleaning methods, the possible plasma
cleaning is the most thorough cleaning method of all the stripping
cleaning.
Comparison with plasma cleaning and wet cleaning:
(1) wet chemical cleaning time and chemical solvents are sensitive to
the process and the plasma cleaning process is easier to control.
(2)
to remove oil and oxide and other processes, the wet chemical cleaning
need to be further removed and treated or need to clean several times,
and plasma cleaning as long as once, basically no residue.
(3)
wet chemical cleaning after a lot of waste also need to be further
processed, it also takes more time and manpower, but the plasma cleaning
reaction by-products of gas, through the vacuum system and neutralizer
can be directly discharged into the atmosphere.
(4) on the toxicity: wet chemical cleaning solvents and acids have a
very high toxicity, and plasma cleaning reaction gas required mostly
non-toxic, the staff use the plasma cleaning for a long time will not
harm the body.
Plasma
cleaning techniques have several advantages over conventional chemical
cleaning, which provides a low-temperature environment due to the use of
electrical energy to catalyze chemical reactions rather than thermal
energy. The plasma eliminates the risk of wet chemical cleaning and is no waste compared to other cleaning. Now
the field of plasma cleaning technology applications more and more
widely, the development prospects are very broad, at the same time for
all walks of life to solve many problems. Three
and Boda Electrical Technology Co., Ltd. independent research and
development of various models of vacuum and atmospheric plasma cleaning
machine, hope to solve more customers of the problem, please call
negotiations, and seek cooperation and common development.
2017-08-03
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